Advances in Atomic, Molecular, and Optical

This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics. Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.

Contributors

ix

Plasma Processing of Materials and Atomic, Molecular, and Optical Physics. An Introduction

Hiroshi Tanaka

Mitio Inokuti

Introduction

1

(2)

Plasma Formation and Collision Processes

3

(4)

Plasma Diagnosis and Modeling

7

(5)

Pertinent Topics from Atomic, Molecular, and Optical Physics

12

(4)

Acknowledgments

16

(1)

References

16

(4)

The Boltzmann Equation and Transport Coefficients of Electrons in Weakly Ionized Plasmas

R. Winkler

Introduction

20

(4)

Kinetic Description of the Electrons

24

(8)

Electron Kinetics in Time- and Space-Independent Plasmas

32

(15)

Electron Kinetics in Time-Dependent Plasmas

47

(14)

Electron Kinetics in Space-Dependent Plasmas

61

(14)

Concluding Remarks

75

(1)

Acknowledgments

76

(1)

References

76

(3)

Electron Collision Data for Plasma Chemistry Modeling

W.L. Morgan

Dedication

79

(1)

Introduction

80

(1)

Sources of Data and Interpretations

81

(9)

Discussion of Data for Specific Processes and Species

90

(14)

Concluding Remarks: Journals, Databases, and the World Wide Web

104

(3)

Acknowledgements

107

(1)

References

107

(4)

Electron-Molecule Collisions in Low-Temperature Plasmas: The Role of Theory

Carl Winstead

Vincent McKoy

Introduction

111

(2)

Types of Cross Sections

113

(8)

Cross-Section Calculations at Low Energy

121

(3)

Methods in Current Use

124

(15)

Areas for Future Progress

139

(4)

Acknowledgements

143

(1)

References

143

(4)

Electron Impact Ionization of Organic Silicon Compounds

Ralf Basner

Kurt Becker

Hans Deutsch

Martin Schmidt

Introduction

147

(2)

Ionization-Cross-Section Measurements

149

(7)

Semiempirical Calculation of Total Single Ionization Cross Sections

156

(4)

Ionization Cross Sections of SiHx (x = 1 to 4) and of Selected Si-Organic Compounds

160

(17)

Comparison with Ion Formation Processes and Ion Abundances in Plasmas

177

(4)

Summary

181

(1)

Acknowledgments

182

(1)

References

182

(6)

Kinetic Energy Dependence of Ion-Molecule Reactions Related to Plasma Chemistry

P. B. Armentrout

Introduction

188

(1)

Experimental Methods

189

(6)

Reactions with Silane (SiH4)

195

(9)

Reactions Involving Organosilanes

204

(3)

Reactions with Silicon Tetrafluoride (SiF4)

207

(8)

Reactions with Silicon Tetrachloride (SiCl4)

215

(4)

Reactions with Fluorocarbons (CF4 and C2F6)

219

(4)

Miscellaneous Thermochemical Studies

223

(2)

Conclusions

225

(1)

Acknowledgment

226

(1)

References

226

(5)

Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas

Yoshihiko Hatano

Introduction

231

(1)

Atomic and Molecular Processes in Reactive Plasmas

232

(1)

Overview and Comments on Free Radical Reactions in Reactive Plasmas

233

(2)

Deexcitation of Excited Rare Gas Atoms by Molecules Containing Group IV elements

235

(5)

Comments on Atomic and Molecular Processes in Reactive Plasmas from Physicochemical Viewpoints

240

(1)

References

240

(3)

Ion-Molecule Reactions

Werner Lindinger

Armin Hansel

Zdenek Herman

Introduction

243

(6)

Reaction Rate Constants of Ion-Molecule Reactions

249

(4)

Types of Ion-Molecule Processes

253

(26)

Effect of Internal Energy and Temperature on IM Processes

279

(9)

Concluding Remarks

288

(1)

Acknowledgments

289

(1)

References

289

(6)

Uses of High-Sensitivity White-Light Absorption Spectroscopy in Chemical Vapor Deposition and Plasma Processing

L.W. Anderson

A.N. Goyette

J.E. Lawler

Introduction

295

(1)

High-Sensitivity White-Light Absorption Spectroscopy

296

(7)

The Uses of High-Sensitivity White-Light Absorption Spectroscopy in the CVD of Diamond Films

303

(29)

The Uses of High-Sensitivity White-Light Absorption Spectroscopy in Other CVD Environments

332

(2)

Other Uses of High-Sensitivity White-Light Absorption Spectroscopy

334

(3)

Conclusion

337

(1)

Acknowledgments

338

(1)

References

338

(3)

Fundamental Processes of Plasma-Surface Interactions

Rainer Hippler

Introduction

341

(2)

Theoretical Considerations

343

(15)

Scattering of Ions at Surfaces

358

(3)

Physical Sputtering

361

(6)

Chemical Effects

367

(3)

References

370

(4)

Recent Applications of Gaseous Discharges: Dusty Plasmas and Upward-Directed Lightning

Ara Chutjian

Dust in Plasma Environments

374

(12)

Elves, Red Sprites, and Blue Jets

386

(9)

Acknowledgments

395

(1)

References

395

(11)

Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry

Kurt Becker

Hans Deutsch

Mitio Inokuti

Acknowledgement

406

(1)

References

406

(1)

Subject Index

407

(8)

Contents of Volumes in This Series

415

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Advances in Atomic, Molecular, and Optical Physics

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