Influence of Temperature on Microelectronics and System Reliability: A Physics of Failure Approach

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Influence of Temperature on Microelectronics and System Reliability: A Physics of Failure Approach by Lall; Pradeep, 9780849394508
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  • ISBN: 9780849394508 | 0849394503
  • Cover: Hardcover
  • Copyright: 4/24/1997

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This new book raises the level of understanding of thermal design criteria. It provides the design team with sufficient knowledge to help them evaluate device architecture trade-offs & the effects of operating temperatures. The book provides the reader a sound scientific basis for system operation at realistic steady state temperatures without reliability penalties. Higher temperature performance than is commonly recommended is shown to be cost effective in production for life cycle costs. The microelectronic package considered in the book is assumed to consist of a semiconductor device with first-level interconnects that may be wirebonds, flip-chip, or tape automated bonds; die attach; substrate; substrate attach; case; lid; lid seal; & lead seal. The temperature effects on electrical parameters of both bipolar & MOSFET devices are discussed, & models quantifying the temperature effects on package elements are identified. Temperature-related models have been used to derive derating criteria for determining the maximum & minimum allowable temperature stresses for a given microelectronic package architecture. The first chapter outlines problems with some of the current modeling strategies. The next two chapters present microelectronic device failure mechanisms in terms of their dependence on steady state temperature, temperature cycle, temperature gradient, & rate of change of temperature at the chip & package level. Physics-of-failure based models used to characterize these failure mechanisms are identified & the variabilities in temperature dependence of each of the failure mechanisms are characterized. Chapters 4 & 5 describe the effects of temperature on the performance characteristics of MOS & bipolar devices. Chapter 6 discusses using high-temperature stress screens, including burn-in, for high-reliability applications. The burn-in conditions used by some manufacturers are examined & a physics-of-failure approach is described. The final chapter overviews existing guidelines for thermal derating of microelectronic devices, which presently involve lowering the junction temperature. The reader then learns how to use physics-of-failure models presented in the previous chapters for various failure processes, to evaluate the sensitivity of device life to variations in manufacturing defects, device architecture, temperature, & non-temperature stresses.
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