Adsorption on Silica Surfaces

"Progresses from theoretical issues to applications. Contains a historical overview, in-depth considerations of various scenarios of silica adsorption, and results from the latest research. Invaluable for broad coverage of the expanding field of silica research."

Henri Balard: Institut de Chimie des Surfaces et Interfaces, Mulhouse, France A. Bogdan: Department of Physics, University of Helsinki, Finland Aleksander Brodka: Institute of Physics, University of Silesia, Katowice, Poland Gianfranco Cerofolini: ST Microelectronics, Agrate, Italy Jean-Pierre Cohen Addad: Department of Physics, University Joseph Fourier, Grenoble, France Valdimir Ya. Davydov: Department of Chemistry, M. V. Lomonosov Moscow State University, Russia Martial Deruelle: Rhodia-Silicone, Rhodia, Saint Fons, France Patricia M. Dove: School of Earth and Atmospheric Sciences, Georgia Institute of Technology, Atlanta V. Ehwald: Institut fur Anorganische Chemie und Analytische Chemie, Johannes Gutenberg-Universitat, Mainz, Germany Gamal M. S. El Shafei: Department of Chemistry, Faculty of Science, Ain Shams University, Cairo, Egypt Glen E. Fryxell: Department of Material Sciences, Battelle Pacific Northwest National Laboratory, Richland, Washington Bice Fubini: Department of Inorganic, Physico-Chemical, and Material Chemistry, University of Torino, Italy Ian D. Gay: Department of Chemistry, Simon Fraser University, Burnaby, British Columbia, Canada Jacek Goworek: Department of Adsorption and Planar Chromatography, Maria Curie Sklodowska University, Lublin, Poland F. Grossmann: Institut fur Anorganische Chemie und Analytische Chemie, Johannes Gutenberg-Universitat, Mainz, Germany Hubert Hervet: Laboratoire de Physique des Fluides Organises, College de France, Paris Jonathan P. Icenhower: Applied Geology and Geochemistry, Battelle Pacific Northwest National Laboratory, Richland, Washington Erwin Killmann: Institut fur Technische Chemie, Technische Universitat Munchen, Germany Marek Kosmulski: Department of Electrochemistry, Technical University of Lublin, Poland, and Department of Physical Chemistry, Abo Akademi, Finland Dipika Kumar: Institut fur Anorganische Chemie und Analytische Chemie, Johannes Gutenberg-Universitat, Mainz, Germany Liliane Leger: Laboratoire de Physique des Fluides Organises, College de France, Paris Jun Liu: Department of Material Sciences, Battelle Pacific Northwest National Laboratory, Richland, Washington L. Meda: EniChem, Centro Ricerche di Novara, Italy Barry A. Morrow: Department of Chemistry, University of Ottawa, Ontario, Canada Eugene Papirer: Institut de Chimie des Surfaces et Interfaces, Mulhouse, France Jacques Persello: Universite de Franche Comte--UFR Sciences et Techniques, Besancon, France N. Re: Department of Chemistry, University of Perugia, Italy P. Somasundaran: Henry Krumb School of Mines, Columbia University, New York V.A. Tertykh: Institute of Surface Chemistry, National Academy of Sciences, Kiev, Ukraine Klaus Unger: Institut fur Anorganische Chemie und Analytische Chemie, Johannes Gutenberg-Universitat, Mainz, Germany HenriVan Damme: Centre de Recherche sur la Matiere Divisee, CNRS, and Universite d'Orleans, France Caroll Vergelati: Rhone Poulenc Industrialisation, CR Carrieres, Saint Fons, France William E. Wallace: U.S. National Institute for Occupational Safety and Health, Morgantown, West Virginia V. V. Yanishpolskii: Institute of Surface Chemistry, National Academy of Sciences, Kiev, Ukraine L. Zhang: Henry Krumb School of Mines, Columbia University, New York