Fundamentals of Electrochemical Deposition

, by Paunovic, Milan; Schlesinger, Mordechay

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ISBN: 9780471712213 | 0471712213
Cover: Hardcover
Copyright: 7/28/2006

Fundamentals of Electrochemical Deposition > ISBN13: 9780471712213

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Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

MILAN PAUNOVIC, PhD, was, until recently, a research staff member in the Electrodeposition Technology Department at the IBM T. J. Watson Research Center. He began work on electrochemical metal deposition in 1961 at the University of Pennsylvania, Philadelphia, and subsequently worked on metal deposition at Reynolds Metals, Kollmorgen, and Intel. He is a coauthor of the first edition of Fundamentals of Electrochemical Deposition and Modern Electroplating (both by Wiley), has edited four symposia proceedings volumes of The Electrochemical Society, published forty-one papers, and holds seven patents.

MORDECHAY SCHLESINGER, PhD, is a professor in the Department of Physics at the University of Windsor, Ontario, Canada. He is a former associate editor of both the Journal of The Electrochemical Society and Electrochemical and Solid State Letters. He is a fellow of the American Physical Society and The Electrochemical Society. He has also been named a General Motors Academic Research Fellow. He is a coauthor of the first edition of Fundamentals of Electrochemical Deposition and of Modern Electroplating. He has published over 120 research papers and holds four patents.

Preface to the Second Edition

vii

Preface to the First Edition

1. Overview

(6)

2. Water and Ionic Solutions

(18)

3. Metals and Metal Surfaces

(16)

4. Metal—Solution Interphase

(14)

5. Equilibrium Electrode Potential

(22)

6. Kinetics and Mechanism of Electrodeposition

(36)

7. Nucleation and Growth Models

113

(26)

8. Electroless Deposition

139

(30)

9. Displacement Deposition

169

(8)

10. Effect of Additives

177

(22)

11. Electrodeposition of Alloys

199

(10)

12. Metal Deposit and Current Distribution

209

(12)

13. Characterization of Metallic Surfaces and Thin Films

221

(16)

14. In Situ Characterization of Deposition

237

(12)

15. Mathematical Modeling in Electrochemistry

249

(24)

16. Structure and Properties of Deposits

273

(16)

17. Electrodeposited Multilayers

289

(18)

18. Interdiffusion in Thin Films

307

(14)

19. Applications in Semiconductor Technology

321

(12)

20. Applications in the Fields of Magnetism and Microelectronics

333

(12)

21. Frontiers in Applications: The Field of Medicine

345

(10)

Index

355

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Fundamentals of Electrochemical Deposition

Summary

Author Biography

Table of Contents

Supplemental Materials