Handbook of Silicon Semiconductor Metrology

A description of cleanroom-based measurement technology used during the manufacture of silicon integrated circuits. It covers model-based, critical dimension, overlay, acoustic film thickness, dopant dose, junction depth, and electrical measurements; particle and defect detection; and flatness following chemical mechanical polishing. It surveys key areas such as optical measurements and in-line calibration methods.

Preface

v

Acknowledgments

vii

Contributors

xiii

Introduction

Silicon Semiconductor Metrology

1

(16)

Alain C. Diebold

Transistor Fabrication Metrology

Gate Dielectric Metrology

17

(32)

Clive Hayzelden

Metrology for Ion Implantation

49

(10)

Lawrence A. Larson

MOS Device Characterization

59

(38)

Eric M. Vogel

Veena Misra

Carrier Illumination Characterization of Ultra-Shallow Implants

97

(20)

Peter Borden

Laurie Bechtler

Karen Lingel

Regina Nijmeijer

Modeling of Statistical Manufacturing Sensitivity and of Process Control and Metrology Requirements for a 0.18-μm NMOSFET

117

(26)

Peter M. Zeitzoff

On-Chip Interconnect Metrology

Overview of Metrology for On-Chip Interconnect

143

(6)

Alain C. Diebold

Metrology for On-Chip Interconnect Dielectrics

149

(18)

Alain C. Diebold

William W. Chism

Thaddeus G. Dziura

Ayman Kanan

Thin-Film Metrology Using Impulsive Stimulated Thermal Scattering (ISTS)

167

(30)

Michael Gostein

Matthew Banet

Michael A. Joffe

Alex A. Maznev

Robin Sacco

John A. Rogers

Keith A. Nelson

Metal Interconnect Process Control Using Picosecond Ultrasonics

197

(18)

Alain C. Diebold

Robert Stoner

Sheet Resistance Measurements of Interconnect Films

215

(30)

Walter H. Johnson

Characterization of Low-Dielectric Constant Materials

245

(34)

Michael Kiene

Michael Morgen

Jie-Hua Zhao

Chuan Hu

Taiheui Cho

Paul S. Ho

High-Resolution Profilometry for CMP and Etch Metrology

279

(16)

Anna Mathai

Clive Hayzelden

Lithography Metrology

Critical-Dimension Metrology and the Scanning Electron Microscope

295

(40)

Michael T. Postek

Andras E. Vladar

Scanned Probe Microscope Dimensional Metrology

335

(42)

Herschel M. Marchman

Joseph E. Griffith

Electrical CD Metrology and Related Reference Materials

377

(34)

Michael W. Cresswell

Richard A. Allen

Metrology of Image Placement

411

(66)

Alexander Starikov

Scatterometry for Semiconductor Metrology

477

(38)

Christopher J. Raymond

Defect Detection and Characterization

Unpatterned Wafer Defect Detection

515

(32)

Po-Fu Huang

Yuri S. Uritsky

C. R. Brundle

Particle and Defect Characterization

547

(36)

C. R. Brundle

Yuri S. Uritsky

Calibration of Particle Detection Systems

583

(18)

John C. Stover

Sensor-Based Metrology

In Situ Metrology

601

(78)

Gabriel G. Barna

Bradley Van Eck

Jimmy W. Hosch

Data Management

Metrology Data Management and Information Systems

679

(26)

Kenneth W. Tobin, Jr.

Leonard Neiberg

Electrical Measurement-Based Statistical Metrology

Statistical Metrology, with Applications to Interconnect and Yield Modeling

705

(18)

Duane S. Boning

Overviews of Key Measurement and Calibration Technology

Physics of Optical Metrology of Silicon-Based Semiconductor Devices

723

(38)

Gerald E. Jellison, Jr.

Ultraviolet, Vacuum Ultraviolet, and Extreme Ultraviolet Spectroscopic Reflectometry and Ellipsometry

761

(28)

J. L. Stehle

P. Boher

C. Defranoux

P. Evrard

J. P. Piel

Analysis of Thin-Layer Structures by X-Ray Reflectometry

789

(22)

Richard D. Deslattes

Richard J. Matyi

Ion Beam Methods

811

(40)

Wolf-Hartmut Schulte

Brett Busch

Eric Garfunkel

Torgny Gustafsson

Electron Microscopy-Based Measurement of Feature Thickness and Calibration of Reference Materials

851

(14)

Alain C. Diebold

Status of Lithography Metrology as of the End of 2000

865

(4)

Alain C. Diebold

Index

869

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Handbook of Silicon Semiconductor Metrology

Summary

Table of Contents

Supplemental Materials