Plasma Etching Fundamentals and Applications

, by Sugawara, M.; Stansfield, Barry L.; Handa, S.; Fujita, K.; Watanabe, S.; Tsukamoto, T.

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ISBN: 9780198562870 | 019856287X
Cover: Hardcover
Copyright: 7/30/1998

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This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

1. Introduction

(13)

1.1. Why do we need plasma?

(1)

1.2. Plasmas

(11)

References

(1)

2. RF discharges

(52)

2.1. Comparison with DC discharges

(21)

2.2. Construction and maintenance of the RF discharge

(27)

2.3. Summary of RF discharge characteristics

(1)

References

(3)

3. Physical basis of the plasma etching process

(35)

3.1. Process requirements for plasma etching

(3)

3.2. Main characterizing parameters for plasma etching

(1)

3.3. Summary of the etching model

(1)

References

(2)

4. Plasma particles and potentials

101

(79)

Barry L. Stansfield

4.1. Introduction

101

(1)

4.2. Probes

102

(32)

4.3. Particle energy analysers

134

(9)

4.4. Mass spectrometry

143

(2)

4.5. Microwave interferometry

145

(3)

4.6. Spectroscopy

148

(24)

4.7. Summary

172

(1)

References

173

(7)

5. Technology of reactive ion etching

180

(32)

S. Handa

5.1. Introduction

180

(5)

5.2. Reactive ion etching

185

(2)

5.3. Etching processes

187

(8)

5.4. Qualification of RIE apparatus

195

(13)

5.5. Future aspects of RIE

208

(2)

5.6. Summary

210

(1)

References

210

(2)

6. Magnetic field coupled etchers

212

(40)

K. Fujita

6.1. Introduction

212

(1)

6.2. RF magnetron-type plasma discharges

213

(14)

6.3. Effects of the magnetic field configuration on the two-dimensional ion behaviour in ECR microwave plasmas

227

(10)

6.4. Large-diameter ECR microwave plasma production with ring-type slot antennas

237

(7)

6.5. RF plasma production based on a new principle of `electron sheath resonance'

244

(4)

6.6. Summary

248

(1)

References

249

(3)

7. ECR plasma etchers

252

(65)

S. Watanabe

7.1. Introduction

252

(4)

7.2. ECR plasma theory

256

(11)

7.3. ECR plasma generation

267

(26)

7.4. ECR plasma etching

293

(15)

7.5. Summary

308

(6)

References

314

(3)

8. Future prospects of plasma etching

317

(24)

T. Tsukamoto

8.1. Introduction

317

(1)

8.2. An approach to large-diameter etching

318

(10)

8.3. An approach to precise pattern fabrication

328

(7)

8.4. Approaches to damage-free etching

335

(2)

8.5. Summary

337

(1)

References

338

(3)

Index

341

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Plasma Etching Fundamentals and Applications

Summary

Table of Contents

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Plasma Etching Fundamentals and Applications

Summary

Table of Contents

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