Polymeric Materials for Microelectronic Applications Science and Technology

, by Ito, Hiroshi; Tagawa, Seiichi; Horie, Kazuyuki

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ISBN: 9780841230552 | 0841230552
Cover: Hardcover
Copyright: 5/5/1995

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Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating materials in microelectronics; photoresponsive materials; silicon-containing polymers; conducting polymers; and optoelectronic materials. Includes international contributions from both academia and industry.

Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids
Photochemistry of Liquid-Crystalline Polymers
Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study
Luminescence Study of Ion-Irradiated Aromatic Polymers
New Directions in the Design of Chemically Amplified Resist
Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration
Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists
Acid Generation in Chemivcally Amplified Resist Films
Radiation-Induced Reactions of Onium Salts in Novolak
Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography
Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanisms of Triaryl Phosphate
Effect of Water on the Surface Insoluble Layer of Chemical Amplified Positive Resists
Thermal Properties of a Chemically Amplified Resist Resin
Modeling and Simulation of Chemically Amplified Resist Systems
Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer Interface
Surface Imaging for Applications to Sub-0.35-mm Lithography
Molecular Design of Epoxy Resins for Microelectronics Packaging
Uniaxial and In-Plane Molecular Orientation of Polymides and Their Precursor: Studied by Absorption Dichroism of Perylenebisimide Dye
Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as A Dissolution Inhibitor
Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitsive Polyimides
Waveguiding in High-Temperature-Stable Materials
Rodlike Fluorinated Polyimide as in In-Plane Birefringent Optical Material
Preparation of Polyphenylene and Copolymer for Microelectronics Applications
Charge-Carrier Generation and Migration in a Polydiacetylene compound: Pulse Radiolysis, Time-Resolved Microwave Conductivity Study
Excitation Dynamics in Conjugated Polymers
Application of Polyaniline Films to Radiation Dosimetry
Present and Future of Fullerenes: C60 nd Tubules
Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components
Azimuthal Alighment Photocontrol of Piquid Crystals
Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains
Electronic Properties of Polysilanes
UV Photoelectron Spectroscopy of Polysilanes and Polygermanes
Table of Contents provided by Publisher. All Rights Reserved.

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Polymeric Materials for Microelectronic Applications Science and Technology

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Polymeric Materials for Microelectronic Applications Science and Technology

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