Polymers for Microelectronics Resists and Dielectrics

, by Thompson, Larry F.; Willson, C. Grant; Tagawa, Seiichi

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ISBN: 9780841227217 | 0841227217
Cover: Hardcover
Copyright: 5/5/1994

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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materia

Chemical Amplification Mechanisms for Microlithography
Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification
Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols)
Novel Analytic Method of Photoinduced Acid Generation and Evidence of Photosensitization via Matrix Resin
Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging
An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography
A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films
Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene
Synthesis and Polymerization of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist
Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists
Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists
Surface-Imaging Resists Using Photogenerated Acid-Catalyzed SiO2 Formation by Chemical Vapor Deposition
Polysilphenylenesiloxane Resist with Three-Dimensional Structure
Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films
Langmuir-Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists
Photochemical Control of a Morphology and Solubility Transformation in Poly(vinyl alcohol) Films Induced by Interfacial Contact with Siloxanes and Phenol-Formaldehyde Polymeric Photoresists
Advances in the Chemistry of Resists for Ionizing Radiation
Out-of-Plane Expansion Measurements in Polyimide Films
Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes
Synthesis of Perfluorinated Polyimides for Optical Applications
Charged Species in s-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices
Acid-Sensitive Phenol-Formaldehyde Polymeric Resists
Superiority of Bis(perfluorophenyl) Azides over Nonfluorinated Analogues as Cross-Linkers in Polystyrene-Based Deep-UV Resists
New Photoresponsive Polymers Bearing Norbornadiene Moiety Synthesis by Selective Cationic Polymerization of 2-(3-Phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl Vinyl Ether and Photochemical Reaction of the Resulting Polymers
Photoinitiated Thermolysis of Poly(5-norbornene 2, 3-dicarboxylates): A Way to Polyconjugated Systems and Photoresists
Recent Progress of the Application of Polyimides to Microelectronics
Base-Catalyzed Cyclization of ortho-Aromatic Amide Aklyl Esters: A Novel Approach to Chemical Imidization
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Polymers for Microelectronics Resists and Dielectrics

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