In Situ Characterization of Thin Film Growth

Recent advances in techniques to characterise thin films in-situ during deposition could lead to an improved understanding of deposition processes and to better, faster, diagnosis of issues with the deposition process. In-situ characterisation of thin film growth will provide a comprehensive review of this increasingly important topic, focussing on the techniques and concepts. Part 1 reviews electron diffraction techniques, including the methodology for taking observations and measurements. Part 2 covers photoemission techniques; the principles and instrumentation. Part 3 contains photon techniques for real-time characterization of the nucleation, growth, structural and electronic properties of thin films. Part 4 discusses alternative in-situ characterisation techniques and the trend for combining different techniques.