Nanoimprint Technology Nanotransfer for Thermoplastic and Photocurable Polymers

Nanoscale pattern transfer technology using molds is a rapidly advancing area and one that has seen much recent attention due to its potential for use in nanotechnology industries and applications. However, because of these rapid advances, it can be difficult to keep up with the technological trends and the latest cutting-edge methods. In order to fully understand these pioneering technologies, a comprehensive understanding of the basic science and an overview of the techniques are required.

Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers covers the latest nanotransfer science based on polymer behaviour. Polymer fluid dynamics are described in detail, and injection moulding, nanoimprint lithography and micro contact printing are also discussed. Cutting-edge nanotransfer technologies and applications are also considered and future trends in industry are examined.

Key features:
• Covers the fundamentals of nanoimprint technology
• Presents cutting-edge techniques and applications
• Provides industrial examples and describes the mold fabrication process
• Considers nanotransfer of thermoplastics by simulation
• Describes the design and evaluation of UV curable polymer

Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers is a comprehensive reference for industry engineers as well as graduate and undergraduate students, and is a useful source of information for anyone looking to improve their understanding of nanotransfer mechanisms and methods.

Jun Taniguchi, Tokyo University of Science, Japan

Jun Taniguchi is an Associate Professor in the Faculty of Industrial Science and Technology, at Tokyo University of Science in Japan. His research interests include electron beam lithography, nanoimprint lithography and nanotechnology.

Hiroshi Ito, Yamagata University, Japan

Hiroshi Ito is a Professor in the Department of Polymer Science and Engineering at Yamagata University in Japan. He is a board member for the Japan Society of Polymer Processing and Society Plastics Engineers. His major field of research is to clarify and control the development of high-order structure in polymeric materials through experimental and theoretical studies on polymer processing

Jun Mizuno, Waseda University, Japan

Jun Mizuno is an Associate Professor in the Nanotechnology Research Laboratory at Waseda University in Japan. His research interests include nanomaterials and intelligent mechanics.

Takushi Saito, Tokyo Institute of Technology, Japan

Takushi Saito is an Associate Professor in the Department of Mechanical and Control Engineering at Tokyo Institute of Technology in Japan. His research interests include polymer processing, laser assisted manufacturing and micro-scale processing

Chapter 1: What is nanoimprint ?

Chapter 2: Nano-imprinting lithography: Its background and related techniques

2.1. History of material processing – Polymer Processing

2.2. Products with microstructure and nanostructure

2.3. Technology for making micro- and nano-structure

Reference

Chapter 3: Nano pattern transfer technology of thermoplastic materials. 

3.1 Behaviour of thermoplastic material

3.1.1. Thermoplastics

3.1.2. Basis of viscoelastic and rheology

3.1.3. Measurement of rheology

3.1.4. Physical properties of viscoelastic material and temperature–time superposition principle

3.1.5. Materials design for realizing nano-imprints

3.2. Injection molding process and thermal imprint process

3.2.1. Introduction of injection molding process

3.2.2. Problems of injection molding process

3.2.3. Advantages of thermal imprint process

3.3 Pattern transfer mechanism of thermal cycle NIL

3.3.1. Introduction of thermal imprint process

3.3.2. In-situ observation of thermal imprint process

3.3.3. Off-line measurement of replication process in thermal cycle NIL

3.4 Modeling of nano-pattern transfer

3.4.1. Importance of viscosity in thermal imprint process

3.4.2. Mathematical treatment in injection molding and thermal imprint process

3.4.3. Process simulation in the micro-and nano-pattern transfer

Reference

4. Mold fabrication process 

4.1 Ultra precision cutting techniques applied to the metal molds fabrication for Nano-Imprint-Lithography

4.1.1. Introduction

4.1.2. Cutting of fine groove shape

4.1.3 Method of cutting groove

4.1.4 Precision cutting to cylindrical material

4.1.5 High-speed, ultra precision machining system

4.1.6 Fine pattern processing by bit map data

4.1.7 Machining of dot pattern array

4.1.8 Improvement point of the system

4.1.9. Conclusion

4.2. Nanoimprint Mold Fabrication using Photomask Technology

4.2.1 Introduction

4.2.2 Summary of mold manufacturing process

4.2.3 Pattern writing technique

4.2.4 Dry etching

4.2.5 Examples of Fabricated Mold

4.2.6. Conclusion

References

Chapter 5  Ultraviolet Nanoimprint lithography  

5.1 Orientation and background of UV-NIL

5.2 Transfer mechanism of UV-NIL

5.2.1 Viscosity and capillary force

5.2.2 Release coating and evaluation of release properties

5.2.3 Release coating effect

5.3 UV-NIL materials and equipment

5.3.1 Ubiquitous NIL machines

5.3.2 UV Nanoimprint Process Tool

5.3.2.1. UV nanoimprint process

5.3.2.2. Nanoimprint process tool

5.3.2.3. Future works

5.3.3 UV photo-curable resin

5.3.3.1. Free radical polymerization

5.3.3.2. Cationic polymerization

5.3.3.3. Ene-thiol

5.3.3.4. Silicon-containing resin

5.3.3.5. Fluorine-containing resin

5.3.3.6. Removable resin

5.3.4 Fluorinated Polymers for UV-NIL

5.3.4.1 Introduction

5.3.4.2F-template: Perfluorinated polymer mold material for UV nanoimprint

5.3.4.3 NIF: UV curable resin with fluorinated components

5.3.4.4 Mold replication using NIF

5.3.4.5 Summary

5.3.5 Cationic curable resins for UV-NIL

5.3.5.1 Introduction

5.3.5.2 Characteristics of UV cationic curable resins

5.3.5.3 Curing shrinkage

5.3.5.4 Curing rate

5.3.5.5 Demolding

5.3.5.6 Transfarability

5.3.5.7 Activities of Daicel Chemical Industries, Ltd.

5.3.5.8 Conclusions

5.3.6 Molding Agents for Nanoimprinting

5.3.6.1. Silane Coupling Agents

5.3.6.2. Mechanism of Surface Modification using Silane Coupling Agents

5.3.6.3. Synthesis of Thermostable Molding Agents

5.3.6.4. Fluorinated Silane Coupling Agents Thermostable Up to 400 oC

5.3.6.5. Summary

5.4 Evaluation method

5.4.1 Macro evaluation technique of nano scale pattern shape and the evaluation device

5.4.1.1 Starting point of macro observation technique

5.4.1.2 Development of macro observation technique

5.4.1.3 The measurement of the pattern shape by macro method

5.4.1.4 The evaluation of patterning uniformity and fidelity, and the device in NIL

5.4.2 Characterization of Photo-curable resin for UV nanoimprint

5.4.2.1. Basic process characterization

5.4.2.2. Application-oriented characterization

5.4.2.3. Applications for lithography

References

Chapter 6: Applications and leading-edge technology

6.1. Advanced nanoimprinting technologies

6.1.1. Resolution limit of nanoimprint lithography

6.1.2. Improved nanoimprinting technologies

6.1.3. Roll-to-roll nanoimprinting technologies

6.2 Applications

6.2.1 Seamless pattern

6.2.2 Multistep Cu interconnection

6.2.3 GaN nanostructures for high-intensity LED

6.3. High Accuracy Nano-Imprint Technology, Development of Micro Patterning Method and Automatic Process Control Using, Batch Press Type, Step and Repeat Type Nano-Imprint Machine

6.3.1?DIntroduction

6.3.2. Thermal imprint

6.3.2.1?@Thermal imprint process

6.3.2.2?DThermal imprint machine

6.3.2.3?@Result of thermal imprint

6.3.3?DConclusion

6.4 Micro-nano melt transcription molding process 

6.4.1 Outline of the melt transcription molding process

6.4.2 High transcriptability

6.4.3 Excellent optical properties

6.4.4 Melt transcription molding system “MTM100-15”

6.5 Future trends

References

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